B. Process development tools
B. Process development tools
Lithographic modeling has also proved to be a very valuable tool.
Used to develop new lithography process or equipment.
The principle of lithography has been proved to be an invaluable tool for the processing and equipment of lithography models (the word modeling is the key, and the other part of the building owner has to figure out how to translate it himself and then choose a better word. I'll use this for the time being, and then put a question mark. If you want to change it, just say that the model is actually good.
Some of the more common uses include
Some of the more useful uses include
Optimization of dyes
Optimum dyeing
Photoresist loading
Load photoresist, (I don't know how to translate this number, the landlord can do it himself)
Simulation of substrate reflectivity,
Simulate (simulate) the reflectivity of the photosensitive bottom layer.
applicability
adaptability
And the optimization of top and bottom antireflection coatings.
,
And optimizing the top and bottom antireflective coating materials.
And the simulation of the influence of bandwidth on the amplitude of swing curve.
And the amplitude bandwidth of the curve is simulated.
In addition, simulation has been used to help understand the application of thick resist in thin film magnetic head manufacturing.
Model (? ) is widely used in photoresist materials for quality control purposes to test new theories (or formulas, I don't know which word you use professionally)
And determine an appropriate measure of photoresist performance for quality control purposes [34].
And measure that characteristics of the photoresist material. (The last sentence is moved to the front)
Resist users often use modeling as an auxiliary means of new resist evaluation.
Resistors are often modeled (? ) as an aid to new resistance assessment.
On the exposure tool side,
In terms of exposure tools,
Modeling has become an indispensable part of optimizing the numerical aperture and partial coherence of stepper [35-37] and understanding the printing deviation between dense lines and isolated lines [38].
Model (? ) has become an indispensable part of optimizing digital aperture, step overtone layout and understanding the density of printed lines.
The use of optical proximity correction software requires rules on how to perform correction,
The application of optical proximity correction software needs to meet the correction rules. Read English by yourself.
This is usually produced with the help of lithography simulation [39].
This correction often occurs in simulations that help lithography.
As a development tool, lithography simulation is outstanding because of its speed and cost-effectiveness.
As a development tool, the advantages of ordinary printing mode lie in its speed and input and output.
Process development usually includes a large number of experiments to determine the best process conditions.
Process development usually involves continuous experiments to determine the most suitable process conditions.
Solve possible problems,
Discover possible problems
Determine the sensitivity to variables,
The inspiration of measuring variables.
And write the specification limit in the
Input and output of the process.
And the standard definition of input and output in the process of writing.
These activities are often time-consuming and expensive.
These behaviors (those experiments that measure this and that) cost a lot of time and money.
Modeling provides a method to supplement laboratory experiments with simulation experiments to accelerate this process.
Reduce costs.
This model provides a supplement to the laboratory simulation experiment, which can speed up the experiment and reduce the experiment cost.
Considering that a single experimental operation in wafer manufacturing equipment may take several hours to several days,
Imagine that it takes hours or even days for a single adhesive sealing tool for experimental purposes.
The speed advantage of simulation is considerable.
Need to consider the speed advantage of simulation.
This allows more simulation than is actually (or even possible) in the factory. (what is fab? It's vulgar to appear here! Lab can't appear slang with different meanings in the paper, right? )
This makes a larger number of = = = simulations in the laboratory permissible (even possible) (meaning that one is experimental and more likely to be practical).