To meet the use requirements of optical elements in atmospheric radiation system, that is, in visible light and near infrared band.

High transmittance, the membrane system is designed according to the design principle of double effective interface method and TFC membrane system software, with ion assistance.

Auxiliary deposition, electron beam vacuum coating method, through vacuum degree, substrate temperature, evaporation rate, etc.

A 12O was used to adjust the process parameters and improve the film thickness monitoring method. , Gafan, TIOZ and 5 102.

Materials: 400- 1 100nm broadband antireflection film was prepared on K substrate. The transmittance of the film was measured by spectrophotometer.

Transmittance, and the transmittance spectrum curve is obtained. The average reflectivity of the coating at normal incidence is 400- 1 100 nm.

Less than 1.5%. Finally, various environmental tests were carried out on the prepared antireflection film, and the results of environmental tests showed that the film layer

All the indexes have met the design requirements.

Key words: optical film; Atmospheric radiation system; Broadband antireflection film; Ion-assisted;

abstract

In order to meet the operating requirements of theoretical instruments at atmospheric pressure

Radiation system, that is, it must have high transparency, safety, visibility and near infrared ray.

Belt, we use electron ion beam vacuum deposition method, which has fatigue resistance

Deposit system. Structure 15 designed 05 designedbytfcsofwtwarewithdoubleeffeieney.

Interface theory. By optimizing technical parameters, vacuum degree and base

Reservoir temperature, evaporation rate

Deposited the film on the KKSGSubstrative the Fursmaterialsof1203, Gakaufan, TIO:, 5 10:.

The transmittance of the coating was measured by spectrophotometer, gotthesPectrum.

eurvesoftheeoating。 The average effective activity is lower than 1.5% in the case of vertical linear decline.

Through the wavelength of 400 nm-100 nm. In addition, the coating has passed successfully.

Environmental testing, iteanecompletelmeethemandSofatmospheriation systems.

Price ywords:oPtiealthinfilm；; Atmospheric radiation system: broadband coating;

Ion-assisted deposition;

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abstract

abstract

catalogue

Chapter I Introduction ..........................................................................................................................., ... 1

1. 1 development of thin film, ................................. …, ............................... …, ..............? .........？ .............…… 1

Development and application of 1.2 broadband antireflection film. ,' I ... I ....................................................................................... 1

1.3 the content of the paper ......................................................................? ……2

Chapter II Thin Film Design Theory .......................................................' ...' Two' One, ...'' ..................................... Four'

2. 1 Calculation of Optical Film Characteristics ........................................................................................................... IV

2.2 double effective interface method ........................................................................... "an 8.

2.3 Calculation of Weak Absorption of Dielectric Multilayer Films, ........................................................................ ...10

Chapter III Design Theory of Anti-reflection Film ............................................................................................................. 13

3. 1 Requirements for the use of broadband antireflection film, ...................................................... and ......................................... 13.

3.2 Selection of film materials ..............................................................................? …… 13

3.2. 1 Basis for selecting film materials ............................................................................................ 13

3.2.2 Select the film material .......................................................................................................... 15.

3.3 Theoretical basis of antireflection coating design ......................................................................................................... 18

3.3. 1 antireflection principle and calculation of single-layer film, ............................................................. ...18.

3.3.2 Principle and calculation of double-layer antireflection film ........................................................................., ... 20

3.3.3 Principle and calculation of three-layer antireflection coating ....................................................... "...................... 2 1.

3.3.4 Optimization method of multilayer film system ........................................................................................ 22

3.4 Project Design Scheme .......................................................................................? ...？ ...？ ...？ ......……24

The fourth chapter preparation technology ................................................................................................... 26

4. 1 .............................................................................................................. 26, a film preparation device.

4.2 Analysis of main technical factors: ......................................................................................................... 3 1

4.3 Film Forming Process .................................................., ..........................., .................................., 32

4.4 Determination of refractive index of coating materials .................................................................................................... 35

4.5 Preparation Process .................................................................................? ……37

The fifth chapter error and test results analysis ...................................................................................................... 39

5. 1 experimental results ............................................................., .............................., .................... 39

5.2 Error Analysis ............., ...................................................................................., ................, 40

5.3 ................................................................................................................... used for film quality inspection ... 43

Conclusion .............................................................................................................................................. 44

Due to ............................................................................................................................................... 45

Refer to ......................................................................................................................................... 46

The first chapter is introduction.

Development of thin films

As an important branch of modern optics, optical thin films have been widely used in industry, agriculture, architecture and communication fields.

Transportation, medicine, military, astronomy, infrared physics, laser technology and other fields, in people's daily work and health.

Play an increasingly important role in life. Today, with the rapid development of science and technology, modern communication, energy utilization and aerospace.

The rapid development of science and technology has put forward higher requirements for the development of optical films.

Since 1970s, thin film technology has developed by leaps and bounds. Both academically and practically.

Both countries have achieved fruitful results. Thin film technology has become the most active research field in contemporary vacuum technology and material science.

Field plays an important role in the new technological revolution. Combination of Thin Film Technology, Thin Film Materials and Surface Science

It promotes the comprehensive development and application of film products. From the development trend, the film industry at home and abroad is in the ascendant.

There are signs that. Thin film technology will make a major breakthrough in the near future. This will certainly promote the film industry to make greater progress.

Exhibition',]

In recent ten years, with the rapid development of thin film technology, there have been many greater breakthroughs in industry, accompanied by various types.

Development of new materials and discovery of new functions. These have great development potential and provide new technologies.

The technological revolution has provided a reliable foundation. Nowadays, thin film technology and thin film materials are widely used in electronic devices and large-scale integrated circuits.

Besides circuits, it can also be used to extract magnetic films and magnetic recording media, insulating films, dielectric films, piezoelectric films, optical films,

Photoconductive module, sensor film, wear-resistant, corrosion-resistant, self-lubricating film, decorative film and various special needs. negative

As one of the most important optical films, reflective film has attracted more and more attention.

With the popularization of battery application in display equipment, the practical research of antireflection film has become a very meaningful work.

Work.

Development and application of broadband antireflection film

Anti-reflection film, also known as anti-reflection film, is used to reduce the reflection on the surface of optical elements and increase the light in the working band.

Permeability. The anti-reflection film discovered in 1930s promoted the early development of thin film optics. Promote the light of science and technology

From the perspective of chemical development, antireflection film plays the most important role in all optical films. It was not until today that it was born.

In terms of total production, it still surpasses all other types of movies. The appearance of single-layer antireflection film is historic.

An important development. Today it is still widely used to meet some simple purposes. But there are two main problems.

First, for most applications, the residual reflection is still too high; In addition, it will reflect from the uncoated surface.

The light remains neutral, while the light reflected from the surface of the coating destroys the color balance. Modern.

Integrated optical instruments often have many uses, and the working band of optical system may cover visible light, low light, near infrared,

Generally speaking, such an optical system is more complicated, with many optical parts and great loss of light energy. In order to get good

Optical characteristics require ultra-wideband antireflection film on its surface.

(1) Modern military photoelectric instruments are the embodiment carriers of specific products formed by photoelectric devices and their technologies.

The function is more and more advanced, integrating laser rangefinder, thermal imaging, low-light-level night vision and CCD camera.

Our photoelectric products and advanced multifunctional photoelectric sensors are constantly innovating. It is often needed in military photoelectric instruments.

Combined aperture technology such as visible light aiming, low-light-level night vision, CCD TV tracking, laser emission and reception.

Coating 400nm- 1 100nm ultra-wideband antireflection film is a multi-band and wide spectrum window in military photoelectric instruments.

Important technical guarantee of the mouth.

(2) Solar cells are photoelectric devices that convert light energy into electric energy. Its photoelectric conversion efficiency is defined as total.

The ratio of the output power to the total power of sunlight incident on the surface of the solar cell. In order to improve the photoelectric conversion efficiency of the battery,

We should reduce the reflection loss of light on the battery surface and increase the transmission of light. At present, there are two main methods: (1) discharging the battery.

The surface is corroded into a textured surface, which increases the incidence of light on the battery surface. (2) plating one or more layers of optical devices on the surface of the battery

Mass matching antireflection film. The design of antireflection film directly affects the reflectivity of solar cells to incident light, which has a great influence on the sun.

The improvement of battery efficiency plays a very important role.

(3) With the rapid development of aviation, aerospace, infrared imaging, guidance and space observation,

The precision of extracting the optical characteristics of the target is getting higher and higher [9]. When detecting the optical characteristics of the target in the atmospheric background,

The detector not only receives radiation from the target itself, but also receives atmospheric background radiation and solar radiation from the target surface.

The scattering energy of radiation and the background radiation of heaven and earth, together with the randomness of atmospheric parameters, make it possible to extract the optics of the target.

The characteristics are greatly disturbed. The main source of sky background radiation is solar radiation. When solar radiation passes through the atmosphere,

Absorbed and scattered by atmospheric molecules, aerosols and clouds, the solar radiation projected into the upper atmosphere is radiated.

It can't reach the ground completely, and some of it forms sky background radiation through atmospheric scattering. The detection of the target is in

To a great extent, it depends on the following factors: the radiation characteristics of the target itself and the surrounding background, and the pair between them.

Bidu target detection is usually influenced by the atmosphere: the radiation characteristics of the target and background finally reach the observer through the atmosphere.

The transmission of radiation signals in the atmosphere is attenuated by the atmosphere, and at the same time, the radiation of the atmosphere or the sun will form certain background radiation.

Shoot me. When the background radiation or atmospheric attenuation is very strong, the target signal is completely submerged in the background radiation and cannot be detected.

Therefore, it is very important to establish a set of methods to accurately calculate the spectral radiation characteristics of the sky background. And broadband increase.

The gas permeable membrane is used as an optical element in the test system of atmospheric radiation system.

All the above-mentioned special-purpose optical devices need broadband antireflection films with wide working spectral range to improve optical elements.

The imaging quality of components, especially in low light level system, night vision system, CCD and atmospheric radiation system.

3. The content of this article.

In this paper, a 400- 1 100nm broadband antireflection film for optical components of atmospheric radiation system is studied.

The computer optimizes the designed film system, and through repeated experiments, the preparation process parameters of antireflection film are optimized.

Finally, the film system that meets the requirements of the project is obtained.

The thesis mainly includes four parts. Firstly, the calculation theory of thin film characteristics, the double effective interface method and the principle of multilayer film are introduced.

Introduction to calculation principle of weak absorption of dielectric thin films. Secondly, the design basis of antireflection film, the selection and utilization of coating materials.

TFC film system design software optimizes the designed film system to realize broadband antireflection in visible light band and near infrared band.

Shoot me. Thirdly, the working principle of the coating machine, the film forming process, the control principle of optically controlled crystal and the coating operation process. Fourth,

In the actual coating process, the search for the best preparation process parameters has been completed, such as substrate temperature, working pressure, oxygen.

The influence of film-forming process parameters such as gas content on optical properties was analyzed, and the film was prepared under the optimum process parameters.

Preparation of membrane. The properties of the samples were tested, and the differences of optical properties between the theoretically designed film system and the actually prepared film system were analyzed.

Reason.

Because the spectrophotometer in the laboratory is not equipped with accessories to measure the reflectivity of the substrate, the experimental results in this paper are true.

Based on the transmittance of the substrate.

The equipment used in this experiment is Nanguang 700 coating machine, which is obtained by electron beam evaporation ion-assisted method.

It has a relatively strong and dense film layer. The function of ion assistance is to clean the surface of the substrate before evaporation and make the film

The layered structure is firmer and denser. This can reduce the surface transmittance of the film and the loss of absorption and scattering caused by the antireflection band.

The decline of bandwidth.

Wait a minute.